Changing molecular orientation in fluorocarbon thin films deposited by different photo-processing: Synchrotron radiation etching vs laser ablation

Journal of Physical Chemistry B

Volumn 104, Issue 26, 2000, Pages 6212-6217

  Zhang, Y ^a   Katoh, T ^a   Endo, A ^a  

^a SUMITOMO HEAVY INDUSTRIES LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; CRYSTAL WHISKERS; CRYSTALLIZATION; DEPOSITION; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LASER ABLATION; MASS SPECTROMETRY; MOLECULAR ORIENTATION; POLYTETRAFLUOROETHYLENES; SYNCHROTRON RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTO PROCESSING; PHOTOFRAGMENTS; POLYTETRAFLUOROETHYLENE FILM; SYNCHROTRON RADIATION ETCHING;

THIN FILMS;

EID: 0034230368     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp993481l     Document Type: Article

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