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Applied Physics A: Materials Science and Processing

Volumn 78, Issue 2, 2004, Pages 131-140

Influence of Ar, Kr, and Xe layers on the energies and lifetimes of image-potential states on Cu(100)

(4) Berthold, W a Rebentrost, F b Feulner, P c Hofer U a

a PHILIPPS UNIVERSITY MARBURG (Germany)

b MAX PLANCK INSTITUT FÜR QUANTENOPTIK (Germany)

c TECHNICAL UNIVERSITY OF MUNICH (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPUTATIONAL METHODS; CONTINUUM MECHANICS; INTERPOLATION; LOW ENERGY ELECTRON DIFFRACTION; MICROSCOPIC EXAMINATION; MOLECULAR ORIENTATION; MONOLAYERS; PERMITTIVITY; PHOTOEMISSION; PHOTONS; SEMICONDUCTOR QUANTUM WELLS; TEMPERATURE PROGRAMMED DESORPTION; THICK FILMS;

ELECTRON AFFINITY; FEMTOCHEMISTRY;

MOLECULAR PHYSICS;

EID: 0742285881 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-003-2310-6 Document Type: Article

Times cited : (62)

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