Comparing software and hardware simulation tools on an embedded-attenuated PSM

MICRO

Volumn 18, Issue 6, 2000, Pages 69-90

  Poortinga, Eric R ^a,b   Novak, Justin W ^b   Eynon, Benjamin G ^b   Weed, J Tracy ^c   Pang, Linyong ^c   Karklin, Linard ^c  

^a ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

^b PHOTRONICS INC   (United States)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0348246604     PISSN: 10810595     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (8)

1. Information found on Web site of VLSI Research, www. vlsiresearch.com
2. "A Perspective on the EDA Market: Technology Forces Driving SOC Design" (Santa Clara, CA: Collett International, 2000).
3. Numerical Technologies, Virtual Stepper System User's Manual 1.1 (San Jose: Numerical Technologies, 1999).
4. R Budd et al., "Development and Application of a New Tool for Lithographic Mask Evaluation, the Stepper Equivalent Aerial Image Measurement System, AIMS," IBM Journal of Research and Development 41, no. 1-2 (1997): 119-129.
5. P Fiekowski, "The End of Thresholds: Subwavelength Optical Linewidth Measurement Using the Flux-Area Technique," in Proceedings of SPIE Symposium on Photomasks - Japan (Belling-ham, WA: SPIE, 2000).
6. L Karklin, "A Comprehensive Simulation Study of the Photomask Defect Printability," in Proceedings of SPIE 2621 (Bellingham, WA: SPIE, 1995), 490-504.
7. D Taylor and R Eandi, "Advanced Mask Printability Analysis Using TINT Virtual Stepper System," in Proceedings of SPIE 3546 (Bellingham, WA: SPIE, 1998), 466-476.
8. K Phan et al., "Comparison of Binary Mask Defect Printability Analysis Using Virtual Stepper System and Aerial Image Measurement System," in Proceedings of SPIE 3873 (Bellingham, WA: SPIE, 1999), 681-692.