Comparison of binary mask defect printability analysis using virtual stepper system and aerial image microscope system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3873, Issue , 1999, Pages

  Phan, Khoi ^a   Spence, Christopher ^a   Dakshina Murthy, S ^a   Bala, Vidya ^a   Williams, Alvina M ^a   Strener, Steve ^a   Eandi, Richard D ^a   Li, Junling ^a   Karklin, Linard ^a  

^a ADVANCED MICRO DEVICES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; CRYSTAL DEFECTS; PRINTING; SCANNING ELECTRON MICROSCOPY; VIRTUAL REALITY;

AERIAL IMAGE MEASUREMENT SYSTEM (AIMS); BINARY MASK; DEFECT PRINTABILITY; VIRTUAL STEPPER SYSTEM (VSS);

MASKS;

EID: 0033326275     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)