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Volumn 362, Issue 1814, 2004, Pages 125-138

Dry etching and sputtering

Author keywords

Damage; Dry etching; Low energy ions; Nanofabrication; Reactive ion etching

Indexed keywords


EID: 0348062772     PISSN: 1364503X     EISSN: None     Source Type: Journal    
DOI: 10.1098/rsta.2003.1307     Document Type: Article
Times cited : (34)

References (23)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.