Atomic force microscopy study on topography of films produced by ion-based techniques

Journal of Applied Physics

Volumn 80, Issue 5, 1996, Pages 2658-2664

  Wang, X ^a   Liu, X H ^a   Zou, S C ^a   Martin, P J ^b   Bendavid, A ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0013121427     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.363182     Document Type: Article

References (13)

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