On the structure and optical dielectric constants of TiO2 sputtered thin films

Journal of Optoelectronics and Advanced Materials

Volumn 3, Issue 1, 2001, Pages 95-100

  Mardare, D ^a   Rusu, G I ^a  

^a ALEXANDRU IOAN CUZA UNIVERSITY OF IASI   (Romania)

Author keywords

AFM; High frequency electrical conductivity; Optical dielectric constants; Rf sputtering; Tio2 thin films

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRIC CONDUCTIVITY; HIGH-K DIELECTRIC; OPTICAL PROPERTIES; OXIDE MINERALS; SEMICONDUCTOR DOPING; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; SURFACE ROUGHNESS; TITANIUM DIOXIDE;

DISPERSION FUNCTION; ELECTRICAL CONDUCTIVITY; OPTICAL DIELECTRIC CONSTANT; REACTIVE RF SPUTTERING; RF-SPUTTERING; SPECTRAL DEPENDENCY; SPUTTERED THIN FILMS; TIO2 THIN FILMS;

THIN FILMS;

EID: 0347866997     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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