Total-reflection X-ray fluorescence analysis for semiconductor process characterization

Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 58, Issue 12, 2003, Pages 2085-2092

  Mori, Yoshihiro ^a   Uemura, Kenichi ^a  

^a Wacker NSCE Corporation   (Japan)

Author keywords

Reference standard sample; Semiconductor; Sweeping TXRF; Total reflection X ray fluorescence (TXRF); Vapor phase decomposition (VPD)

Indexed keywords

CHEMISORPTION; CONTAMINATION; COST EFFECTIVENESS; DETECTORS; FLUORESCENCE; LSI CIRCUITS; RELIABILITY; SALES; SHRINKAGE; SILICON WAFERS; SPIN COATING; SURFACE PROPERTIES; TRANSITION METALS; X RAY SPECTROSCOPY;

PHYSISORPTION; VAPOR PHASE DECOMPOSITION (VPD);

SEMICONDUCTOR MATERIALS;

EID: 0347592048     PISSN: 05848547     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0584-8547(03)00212-X     Document Type: Conference Paper

References (22)

1. International Technology Roadmap for Semiconductors, http://public.itrs.net/.
2. Fabry L., Pahlke S., Kotz L., Wobrauschek P., Streli C. Fresen. J. Anal. Chem. 363:1999;98-102.
3. Pahlke S., Fabry L., Kotz L., Mantler C., Ehmann T. Spectrochim. Acta Part B. 56:2001;2261-2274.
4. Mori Y., Shimanoe K., Sakon T. Anal. Sci. 11:1995;499-504.
5. Mori Y., Uemura K. X-Ray Spectrom. 28:1999;421-426.
6. A. Shimazaki, H. Hiratsuka, Y. Matsushita, S. Yoshii, Extended Abstracts of 16th (1984 International) Conference on Solid State Devices and Materials, Kobe, Japan (1984) 281-284.
7. Mori Y., Uemura K., Iizuka Y. Anal. Chem. 74:2002;1104-1110.
8. Hourai M., Naridomi T., Oka Y., Murakami K., Sumita S., Fujino N., Shiraiwa T. Jpn. J. Appl. Phys. 27:1988;L2361-L2363.
9. Mori Y., Sakon T., Shimanoe K. Adv. X-Ray Chem. Anal. Jpn. 27:1996;59-70.
10. Weisbrod U., Gutschke R., Knoth J., Schwenke H. Fresen. J. Anal. Chem. 341:1991;83-86.
11. Mori Y., Shimanoe K. Anal. Sci. 12:1996;141-143.
12. Kern W., Puotinen D.A. RCA Rev. 31:1970;187-206.
13. J. Atsumi, S. Ohtsuka, S. Munehira, K. Kajiyama, Proceedings of the First International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, Hollywood, ECS Proceedings, PV90-9 (1990) 59-66.
14. M. Sakurai, J. Ryuta, E. Morita, K. Tanaka, T. Yoshimi, Y. Shimanuki, Extended Abstracts of the 177th Electrochemical Society Meeting, Montreal, ECS Proceedings, PV90-1 (1990) 710.
15. Mori Y., Uemura K., Shimanoe K., Sakon T. J. Electrochem. Soc. 142:1995;3104-3109.
16. Ultra Clean Technol. 8:1996;44-82.
17. ISO14706:2000.
18. Yamada T., Matsuo M., Kohno H., Mori Y. Spectrochim. Acta Part B. 56:2001;2307-2312.
19. Ruth K., Schmidt P., Mori E.J. Spectroscopy. 7:(9):1992;36-39.
20. Yamagami M., Nonoguchi M., Yamada T., Shoji T., Utaka T., Nomura S., Taniguchi K., Wakita H., Ikeda S. X-Ray Spectrom. 28:1999;451-455.
21. Mori Y., Uemura K., Iizuka Y. Adv. X-ray Chem. Anal. Jpn. 33:2002;155-174.
22. Yamagami M., Ikeshita A., Onizuka Y., Kojima S., Yamada T. Development of vapor phase decomposition-total reflection X-ray fluorescence spectrometer. Spectrochim. Acta Part B. 58:2003;2079-2084.