Whole-surface analysis of semiconductor wafers by accumulating short-time mapping data of total-reflection x-ray fluorescence spectrometry

Analytical Chemistry

Volumn 74, Issue 5, 2002, Pages 1104-1110

  Mori, Yoshihiro ^a,b   Uernura, Kenichi ^a,b   Iizuka, Yoshinori ^c  

^a NIPPON STEEL CORPORATION   (Japan)

^b Wacker NSCE Corporation   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

SURFACE ANALYSIS;

CHEMICAL ANALYSIS; CONTAMINATION; FLUORESCENCE; NEGATIVE IONS; X RAY SPECTROMETERS;

SEMICONDUCTOR MATERIALS;

ARTICLE; COMPUTER PROGRAM; MATHEMATICAL ANALYSIS; SEMICONDUCTOR; STATISTICS; SURFACE PROPERTY; X RAY FLUORESCENCE; X RAY SPECTROMETRY;

EID: 0036500001     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac0112061     Document Type: Article

References (18)