Novel methods of TXRF analysis for silicon wafer surface inspection

Fresenius' Journal of Analytical Chemistry

Volumn 363, Issue 1, 1999, Pages 98-102

  Fabry, Laszlo ^a   Pahlke, Siegfried ^a   Kotz, Ludwig ^a   Wobrauschek, Peter ^b   Streli, Christina ^b  

^a SILTRONIC AG   (Germany)

^b TU WIEN   (Austria)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003055478     PISSN: 09370633     EISSN: None     Source Type: Journal    
DOI: 10.1007/s002160051145     Document Type: Article

References (15)

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