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Journal of the Physical Society of Japan

Volumn 72, Issue 11, 2003, Pages 2850-2855

Step bunching with alternation of structural parameters

(4) Sato, Masahide a Uwaha, Makio b Mori, Tomonori a Hirose, Yukio a

a KANAZAWA UNIVERSITY (Japan)

b NAGOYA UNIVERSITY (Japan)

Author keywords

Drift of adatoms; Si(001) vicinal face; Step bunching

Indexed keywords

SILICON;

ARTICLE; DIFFUSION; DIFFUSION COEFFICIENT; EVAPORATION; KINETICS; MOLECULAR MODEL; MONTE CARLO METHOD; STRUCTURE ANALYSIS;

EID: 0346895237 PISSN: 00319015 EISSN: None Source Type: Journal
DOI: 10.1143/JPSJ.72.2850 Document Type: Article

Times cited : (7)

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