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Volumn 446, Issue 1, 2004, Pages 99-105
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Structural and optical properties of four-hexagonal polytype nanocrystalline silicon carbide films deposited by plasma enhanced chemical vapor deposition technique
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Author keywords
Nanocrystalline film; Plasma enhanced chemical vapor deposition; Power density; Silicon carbide
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Indexed keywords
DEFECTS;
ENERGY GAP;
GROWTH (MATERIALS);
INFRARED SPECTROSCOPY;
ION BOMBARDMENT;
LIGHT ABSORPTION;
LIGHT EMISSION;
LIGHT TRANSMISSION;
MICROSTRUCTURE;
NANOSTRUCTURED MATERIALS;
PHOTOLUMINESCENCE;
PHOTONS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
RAMAN SPECTROSCOPY;
SILICON CARBIDE;
ULTRAVIOLET RADIATION;
DILUTION RATIO;
PHOTOCARRIERS;
PHOTOELECTRIC CONVERSION;
THIN FILMS;
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EID: 0346781551
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(03)00815-0 Document Type: Article |
Times cited : (15)
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References (28)
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