Structural and optical properties of four-hexagonal polytype nanocrystalline silicon carbide films deposited by plasma enhanced chemical vapor deposition technique

Thin Solid Films

Volumn 446, Issue 1, 2004, Pages 99-105

  Zhang, Hongtao ^a,b   Xu, Zhongyang ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b HUBEI UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Nanocrystalline film; Plasma enhanced chemical vapor deposition; Power density; Silicon carbide

Indexed keywords

DEFECTS; ENERGY GAP; GROWTH (MATERIALS); INFRARED SPECTROSCOPY; ION BOMBARDMENT; LIGHT ABSORPTION; LIGHT EMISSION; LIGHT TRANSMISSION; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; PHOTONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILICON CARBIDE; ULTRAVIOLET RADIATION;

DILUTION RATIO; PHOTOCARRIERS; PHOTOELECTRIC CONVERSION;

THIN FILMS;

EID: 0346781551     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00815-0     Document Type: Article

References (28)

1. Lam M.P., Kornegay K.T. IEEE Trans. Electr. Dev. 46:1998;546.
2. Ryu S. IEEE Electr. Lett. 18:1997;194.
3. Hamakawa Y. Mater. Res. Soc. Symp. Proc. 164:1989;291.
4. Haghiri-Gosnet A.M. J. Vac. Sci. Technol. A. 9:1990;1565.
5. Ma W. Solar Energy Mater. Solar Cells. 34:1994;401.
6. Colinge J.P. MRS Bull. 23:1998;16.
7. Wang J. IEEE Trans. Electr. Dev. 46:1999;589.
8. Veprek S., Heintze M., Bayer R., Jurcik-Rajman M. Mater. Res. Soc. Symp. Proc. 149:1989;3.
9. Kohl R., Wild C. Appl. Phys. Lett. 63:1993;1792.
10. Terashige T., Okano K. IEEE Trans. Electron Dev. 46:1999;555.
11. Namanich R.J., Solin S.A., Martin R.M. Phys. Rev. B. 23:1981;6348.
12. Chayahara A., Matsuda A., Imura T., Osaka Y. Jap. J. Appl. Phys. 25:1986;564.
13. Feng Z.C., Mascarenhas A.J., Choyke W.J., Powell J.A. J. Appl. Phys. 64:1988;3176.
14. Feldman D.W., Parker J.H. Jr., Choyke W.J., Patrik L. Phys. Rev. 170:1968;698.
15. Feldman D.W., Parker J.H. Jr., Choyke W.J., Patrik L. Phys. Rev. 173:1968;787.
16. Katulka G., Guedj C., Kolodzey J., Wilson R.G., Swann C., Tsao M.W., Rabolt J. Appl. Phys. Lett. 74:1999;540.
17. Burton J.C., Sun L., Pophristic M., Lucas S.J., Long F.H., Feng Z.C., Ferguson I.T. J. Appl. Phys. 84:1999;6268.
18. Hayer W., Loudon R. Scattering of Light by Crystals. 1978;Wiley, New York.
19. Petrova-Koch V., Sreseli O. Thin Solid Films. 255:1995;107.
20. Cardona M., Guntherodt G. Light Scattering in Solids. second ed. 1982;Springer Press, New York.
21. Liao L.S., Bao X.M., Yang Z.F., Min N.B. Appl. Phys. Lett. 66:1995;2382.
22. Born M., Wolf E. Principles of Optics. 1959;Pergamon Press, New York.
23. Eckertova L. Physics of Thin Films. 1977;Plenum, New York.
24. Kohl R., Wild C. Appl. Phys. Lett. 63:1993;1792.
25. Parkhutik V.P., Namavar F., Andrade E. Thin Solid Films. 297:1997;229.
26. Kayanuma Y. Phys. Rev. B. 38:1988;9797.
27. Campbell I.H., Fauchet P.M. Solid State Commun. 58:1986;739.
28. Yu M.B., Rusli, Yoon S.F. J. Appl. Phys. 87:2000;8155.