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Volumn 446, Issue 1, 2004, Pages 99-105

Structural and optical properties of four-hexagonal polytype nanocrystalline silicon carbide films deposited by plasma enhanced chemical vapor deposition technique

Author keywords

Nanocrystalline film; Plasma enhanced chemical vapor deposition; Power density; Silicon carbide

Indexed keywords

DEFECTS; ENERGY GAP; GROWTH (MATERIALS); INFRARED SPECTROSCOPY; ION BOMBARDMENT; LIGHT ABSORPTION; LIGHT EMISSION; LIGHT TRANSMISSION; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PHOTOLUMINESCENCE; PHOTONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILICON CARBIDE; ULTRAVIOLET RADIATION;

EID: 0346781551     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00815-0     Document Type: Article
Times cited : (15)

References (28)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.