(Ba,Sr)TiO3 thin film growth in a batch processing MOCVD reactor

Journal of the European Ceramic Society

Volumn 24, Issue 2, 2004, Pages 271-276

  Regnery, S ^a,b   Ehrhart, P ^a   Fitsilis, F ^a   Waser, R ^a   Ding, Y ^a   Jia, C L ^a   Schumacher, M ^b   Schienle, F ^b   Juergensen, H ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b AIXTRON AG   (Germany)

Author keywords

BaTiO3 and titanates; Capacitors; Dielectric properties; Electron microscopy; Thin films

Indexed keywords

CHEMICAL REACTORS; EVAPORATION; FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PERMITTIVITY; SOLUTIONS; THIN FILMS;

DEAD LAYER MODEL; PRECURSORS;

TITANIUM OXIDES;

CERAMICS;

EID: 0346724196     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0955-2219(03)00235-8     Document Type: Article

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