Microstructural observation of focused ion beam modification of Ni silicide/Si thin films

Materials Research Society Symposium - Proceedings

Volumn 438, Issue , 1996, Pages 313-318

  Tanaka, Miyoko ^a   Furuya, Kazuo ^a   Saito, Tetsuya ^a  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL MICROSTRUCTURE; ION BEAMS; IRRADIATION; MILLING (MACHINING); NICKEL COMPOUNDS; PRECIPITATION (CHEMICAL); SEMICONDUCTING SILICON; SPUTTERING; TRANSMISSION ELECTRON MICROSCOPY;

DARK FIELD; ENERGY DISPERSIVE X RAY SPECTROSCOPY; FOCUSED ION BEAM IRRADIATION; NICKEL SILICIDE; SELECTED AREA DIFFRACTION;

SEMICONDUCTING FILMS;

EID: 0030362282     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-438-313     Document Type: Conference Paper

References (19)