Evaluation of self-bias potential distribution on a powered electrode of supermagnetron plasma apparatus

Journal of Applied Physics

Volumn 86, Issue 3, 1999, Pages 1208-1212

  Kinoshita, Haruhisa ^a   Nomura, Shyuji ^a,b   Nakagawa, Yukito ^b   Tsukada, Tsutomu ^b  

^a SHIZUOKA UNIVERSITY   (Japan)

^b Magnetic Thin Film Development Division Process Development Center General Business Headquarters   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346541870     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370872     Document Type: Article

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