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Volumn 10, Issue 11, 1998, Pages 3467-3470

Bis(bis(trimethylsilyl)methyl)tin(IV) Chalcogenides as Possible Precursors for the Metal Organic Chemical Vapor Deposition of Tin(II) Selenide and Tin(II) Telluride Films

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Indexed keywords


EID: 0346418032     PISSN: 08974756     EISSN: None     Source Type: Journal    
DOI: 10.1021/cm980247j     Document Type: Article
Times cited : (38)

References (29)
  • 11
    • 0004004688 scopus 로고
    • VCH: Weinheim, New York, Basel, Cambridge, Tokyo, and references cited therein
    • The Chemistry of Metal CVD; Kodas, T., Hampden-Smith, M., Eds.; VCH: Weinheim, New York, Basel, Cambridge, Tokyo, 1994; p 439 and references cited therein.
    • (1994) The Chemistry of Metal CVD , pp. 439
    • Kodas, T.1    Hampden-Smith, M.2
  • 22
    • 0031000014 scopus 로고    scopus 로고
    • (d) Sheldrick, W. S.; Wachhold, M. Angew. Chem. 1997, 109, 214; Angew. Chem., Int. Ed. Engl. 1997, 36, 206.
    • (1997) Angew. Chem., Int. Ed. Engl. , vol.36 , pp. 206


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.