Investigating the formation of time-dependent haze on stored wafers

MICRO

Volumn 19, Issue 3, 2001, Pages 59-X

  Shive, Larry W ^a,b   Blank, Richard E ^c,d   Lamb, Karen H ^e  

^a MEMC Electronic Materials   (United States)

^b TEXAS A AND M UNIVERSITY   (United States)

^c UNIVERSITY OF ROCHESTER   (United States)

^d MICHIGAN STATE UNIVERSITY   (United States)

^e ST LAWRENCE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0346403979     PISSN: 10810595     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (9)

1. D Kinkead and J Higley, "Targeting Gaseous Contaminants in Wafer Fabs: Fugitive Amines," MICRO 11, no. 6 (1993): 37-40.
2. N Munter et al., "Preparation and Characterization of Time Dependent Haze on Silicon Surfaces," in Proceedings of the Fifth International Symposium on Ultra-Clean Processing of Silicon Surfaces (Leuven, Belgium: ACCO, 2000), 91-92.
3. K Vepa et al., "Role of Organics and Moisture on Silicon Wafer Surfaces," in Proceedings of the ECS Spring Meeting 93, no. 1 (Pennington, NJ: The Electrochemical Society, 1993), 1141-1147.
4. P Sun, M Adams, and T Bridges, "Monitoring Organics on Wafer Surfaces Using Thermal Desorption GC-MSD/AED," MICRO 18, no. 3 (2000): 59-71.
5. P Sun et al., "Molecular and Ionic Contamination Monitoring for Cleanroom Air and Wafer Surfaces" in In-Line Characterization Techniques for Performance and Yield Enhancement in Microelectronic Manufacturing, SPIE Vol. 3215, ed. DK DeBusk and S Ajuria (Bellingham, WA: International Society for Optical Engineering, 1997), 118-127.
6. P Sun and M Adams, "Demonstrating a Contamination-Free Wafer Surface Extraction System for Use with CE and IC," MICRO 17, no. 4 (1999): 41-46.
7. K Vepa, K Baker, and L Shive, "A Method for Native Oxide Thickness Measurement," in Cleaning Technology in Semiconductor Device Manufacturing IV, ed. R Novak and J Ru-zyllo (Pennington, NJ: The Electrochemical Society, 1995), 358-365.
8. F Sugimoto and S Okamura, "Adsorption Behavior of Organic Contaminants on a Silicon Wafer Surface," Journal of the Electrochemical Society 146, no. 7 (1999): 2725-2729.
9. L Shive, C Frey, and C Vitus, "A Probe of Chemical Oxide Growth Conditions," in Proceedings of the Fifth International Symposium on Ultra-Clean Processing of Silicon Surfaces (Leuven, Belgium: ACCO, 2000), 127-128.