Molecular and ionic contamination monitoring for cleanroom air and wafer surfaces

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3215, Issue , 1997, Pages 118-127

  Sun, Peng ^a   Adams, Marty ^a   Shive, Larry ^a   Pirooz, Saeed ^a  

^a MEMC Electronic Materials Inc   (United States)

Author keywords

Capillary electrophoresis; Gas chromatography mass spectrometry; Molecular and ionic contamination; Silicon wafer surfaces

Indexed keywords

AMBIENT AIRS; ANALYTICAL TECHNIQUES; CLEANROOM AIRS; ELECTRONIC INDUSTRIES; GAS CHROMATOGRAPHY MASS SPECTROMETRY; INORGANIC ANIONS; IONIC CONTAMINANTS; METALLICS; METHOD DEVELOPMENTS; MOLECULAR AND IONIC CONTAMINATION; ON WAFERS; ORGANIC CONTAMINANTS; SCALE INTEGRATIONS; SEMICONDUCTOR PRODUCTS; SILICON WAFER SURFACES; ULTRA TRACES; ULTRATRACE LEVELS; UV DETECTIONS; WAFER CLEANINGS; WAFER SURFACES;

AMMONIUM COMPOUNDS; CAPILLARY ELECTROPHORESIS; CHEMICAL SENSORS; CHROMATOGRAPHIC ANALYSIS; CHROMATOGRAPHY; CLEAN ROOMS; DESORPTION; ELECTRIC CONDUCTIVITY; ELECTROCHEMISTRY; ELECTROPHORESIS; GAS CHROMATOGRAPHY; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; IMPURITIES; LABORATORIES; MASS SPECTROMETERS; MASS SPECTROMETRY; NEGATIVE IONS; ORGANIC COMPOUNDS; PHOSPHORUS; SEMICONDUCTING ORGANIC COMPOUNDS; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR MATERIALS; SILICON COMPOUNDS; SILICON WAFERS; SPECTROMETERS; SPECTROMETRY; SPECTRUM ANALYSIS; SURFACE CHEMISTRY; THERMAL DESORPTION;

CONTAMINATION;

EID: 0242412310     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.284674     Document Type: Conference Paper

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