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Volumn 18, Issue 3, 2000, Pages 59-71

Monitoring organics on wafer surfaces using thermal desorption GC-MSD/AED

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0012789989     PISSN: 10810595     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (5)

References (12)
  • 2
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    • Analysis of Organic Contamination in Semiconductor Processing
    • ed. DG Seiler et al. Woodbury, NY: American Institute of Physics
    • P Smith and PM Lindley, "Analysis of Organic Contamination in Semiconductor Processing," in Characterization and Metrology for ULSI Technology: 1998 International Conference, ed. DG Seiler et al. (Woodbury, NY: American Institute of Physics, 1998), 133-139.
    • (1998) Characterization and Metrology for ULSI Technology: 1998 International Conference , pp. 133-139
    • Smith, P.1    Lindley, P.M.2
  • 3
    • 0029541012 scopus 로고
    • The Effect of Airborne Contaminants in the Cleanroom for ULSI Manufacturing Process
    • Piscataway, NJ: IEEE
    • M Tamaoki et al., "The Effect of Airborne Contaminants in the Cleanroom for ULSI Manufacturing Process," in Proceedings of the IEEE/SEMI Advanced Semiconductor Manufacturing Conference (Piscataway, NJ: IEEE, 1995), 322-326.
    • (1995) Proceedings of the IEEE/SEMI Advanced Semiconductor Manufacturing Conference , pp. 322-326
    • Tamaoki, M.1
  • 4
    • 0026944802 scopus 로고
    • Correlating Organophosphorus Contamination on Wafer Surfaces with HEPA-Filter Installation
    • EJ Mori, JD Dowdy, and LW Shive, "Correlating Organophosphorus Contamination on Wafer Surfaces with HEPA-Filter Installation," Microcontamination 10, no. 11 (1992): 35-38.
    • (1992) Microcontamination , vol.10 , Issue.11 , pp. 35-38
    • Mori, E.J.1    Dowdy, J.D.2    Shive, L.W.3
  • 5
    • 0029546775 scopus 로고
    • Establishment of Complete Cleaning Technology for Hydrocarbon Contamination on Si Wafer Surface
    • Mount Prospect, IL: Institute of Environmental Sciences
    • S Ojima et al., "Establishment of Complete Cleaning Technology for Hydrocarbon Contamination on Si Wafer Surface," in Proceedings of the 41st Annual Technical Meeting of the IES (Mount Prospect, IL: Institute of Environmental Sciences, 1995), 441-446.
    • (1995) Proceedings of the 41st Annual Technical Meeting of the IES , pp. 441-446
    • Ojima, S.1
  • 6
    • 0029276010 scopus 로고
    • Application of Ion Mobility Spectrometry to Semiconductor Technology: Outgassing of Advanced Polymers under Thermal Stress
    • KJ Budde et al., "Application of Ion Mobility Spectrometry to Semiconductor Technology: Outgassing of Advanced Polymers under Thermal Stress," Journal of the Electrochemical Society 142, no. 3 (1995): 888-897.
    • (1995) Journal of the Electrochemical Society , vol.142 , Issue.3 , pp. 888-897
    • Budde, K.J.1
  • 7
    • 0023043013 scopus 로고
    • Effect of Organic Contaminants on the Oxidation Kinetics of Silicon at Room Temperature
    • A Licciardello et al., "Effect of Organic Contaminants on the Oxidation Kinetics of Silicon at Room Temperature," Applied Physics Letters 48 (1986): 41-43.
    • (1986) Applied Physics Letters , vol.48 , pp. 41-43
    • Licciardello, A.1
  • 8
    • 0347605789 scopus 로고
    • Direct Surface Analysis of Organic Contamination on Si Wafers
    • Santa Monica, CA: Canon Communications
    • J. Lee et al., "Direct Surface Analysis of Organic Contamination on Si Wafers," in Microcontamination Conference Proceedings (Santa Monica, CA: Canon Communications, 1994), 464-475.
    • (1994) Microcontamination Conference Proceedings , pp. 464-475
    • Lee, J.1
  • 9
    • 0030350836 scopus 로고    scopus 로고
    • Identification of Organic Contamination in Cleanroom Air, on Wafers, and Outgassing from Gloves and Wafer Shippers
    • Sunnyvale, CA : SPWCC
    • M Camenzind, "Identification of Organic Contamination in Cleanroom Air, on Wafers, and Outgassing from Gloves and Wafer Shippers," in Semiconductor Pure Water and Chemicals Conference Proceedings (Sunnyvale, CA : SPWCC, 1996), 352-373.
    • (1996) Semiconductor Pure Water and Chemicals Conference Proceedings , pp. 352-373
    • Camenzind, M.1
  • 10
    • 0030263870 scopus 로고    scopus 로고
    • Identification and Removal of Trace Organic Contamination on Silicon Wafers Stored in Plastic Boxes
    • K Saga and T Hattori, "Identification and Removal of Trace Organic Contamination on Silicon Wafers Stored in Plastic Boxes," Journal of the Electrochemical Society 143, no. 10 (1996): 3270-3284.
    • (1996) Journal of the Electrochemical Society , vol.143 , Issue.10 , pp. 3270-3284
    • Saga, K.1    Hattori, T.2
  • 12
    • 0030244894 scopus 로고    scopus 로고
    • Unintentional Doping of Wafers Due to Organophosphates in the Clean Room Ambient
    • JA Lebens et al., "Unintentional Doping of Wafers Due to Organophosphates in the Clean Room Ambient," Journal of the Electrochemical Society 143, no. 9 (1996): 2906-2909.
    • (1996) Journal of the Electrochemical Society , vol.143 , Issue.9 , pp. 2906-2909
    • Lebens, J.A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.