Kinetics of H atom adsorption on Si(100) at 500-650 K

Journal of Chemical Physics

Volumn 119, Issue 22, 2003, Pages 11906-11911

  Kutana, A ^a   Makarenko, B ^a,b   Rabalais, J W ^a  

^a University of Houston   (United States)

^b IOFFE INSTITUTE   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ATOMS; CHEMISORPTION; COMPUTER SIMULATION; DIFFERENTIAL EQUATIONS; HYDROGEN; HYDROGEN BONDS; LOW ENERGY ELECTRON DIFFRACTION; MATHEMATICAL MODELS; MOLECULAR DYNAMICS; REACTION KINETICS; SILICON;

DANGLING BOND; ELEY-RIDEAL ABSTRACTION; HYDROGEN ATOM ADSORPTION DYNAMICS; ISOTHERMAL ADSORPTION KINETICS;

ADSORPTION;

EID: 0345790276     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1624827     Document Type: Article

References (30)

1. W. Widdra, S. I. Yi, R. Maboudian, G. A. D. Briggs, and W. H. Weinberg, Phys. Rev. Lett. 74, 2074 (1995).
2. K. Sinniah, M. G. Sherman, L. B. Lewis, W. H. Weinberg, J. T. Yates, Jr., and K. C. Janda, Phys. Rev. Lett. 62, 567 (1989).
3. K. Sinniah, M. G. Sherman, L. B. Lewis, W. H. Weinberg, J. T. Yates, Jr., and K. C. Janda, J. Chem. Phys. 92, 5700 (1990).
4. D. D. Koleske, S. M. Gates, and B. Jackson, J. Chem. Phys. 101, 3301 (1994).
5. U. Hansen and P. Vogl, Phys. Rev. B 57, 13295 (1998).
6. T. Sakurai and H. D. Hagstrum, Phys. Rev. B 14, 1593 (1975).
7. John J. Boland, Phys. Rev. Lett. 65, 3325 (1990).
8. John J. Boland, Surf. Sci. 261, 17 (1992).
9. H. N. Waltenburg and J. T. Yates, Jr., Chem. Rev. (Washington, D.C.) 95, 1589 (1995)
10. K. W. Kolasinski, Int. J. Mod. Phys. B 9, 2753 (1995)
11. K. Oura, V. G. Lifshits, A. A. Saranin, A. V. Zotov, and M. Katayama, Surf. Sci. Rep. 35, 1 (1999).
12. M. C. Flowers, N. B. H. Jonathan, A. Morris, and S. Wright, Surf. Sci. 396, 227 (1998).
13. Y. Wei, L. Li, and I. S. T. Tsong, Appl. Phys. Lett. 66, 1818 (1995).
14. Y.-J. Zheng, J. R. Engstrom, J. Zhang, A. Schellinger, and B. A. Joyce, Surf. Sci. 470, 131 (2000).
15. M. P. D'Evelyn, Y. L. Yang, and L. F. Sutcu, J. Chem. Phys. 96, 852 (1992).
16. John J. Boland, Phys. Rev. Lett. 67, 1539 (1991).
17. John J. Boland, J. Vac. Sci. Technol. A 10, 2458 (1992).
18. E. Hill, B. Freelon, and E. Ganz, Phys. Rev. B 60, 15896 (1999).
19. S. K. Jo, J. H. Kang, X.-M. Yan, J. M. White, J. G. Ekerdt, J. W. Keto, and J. Lee, Phys. Rev. Lett. 85, 2144 (2000).
20. D.-S. Lin and R.-P. Chen, Phys. Rev. B 60, R8461 (1999).
21. A. Kubo, Y. Ishii, and M. Kitajima, J. Chem. Phys. 117, 11336 (2002).
22. E. Hayakawa, F. Khanom, T. Yoshifuku, S. Shimokawa, A. Namiki, and T. Ando, Phys. Rev. B 65, 033405 (2002).
23. E. S. Tok, J. R. Engstrom, and H. Chuan Kang, J. Chem. Phys. 118, 3294 (2003).
24. J. E. Vasek, Z. Zhang, C. T. Salling, and M. G. Lagally, Phys. Rev. B 51, 17207 (1995).
25. M. Fehrenbacher, J. Spitzmüller, U. Memmert, H. Rauscher, and R. J. Behm, J. Vac. Sci. Technol. A 14, 1499 (1996).
26. D.-S. Lin, E. S. Hirschorn, T.-C. Chiang, R. Tsu, D. Lubben, and J. E. Greene, Phys. Rev. B 45, 3494 (1992).
27. M. Copel and R. M. Tromp, Phys. Rev. Lett. 72, 1236 (1994).
28. A. Sakai and T. Tatsumi, Appl. Phys. Lett. 64, 52 (1994).
29. O. Grizzi, M. Shi, H. Bu, and J. W. Rabalais, Rev. Sci. Instrum. 61, 740 (1990).
30. P. Kisliuk, J. Phys. Chem. Solids 3, 95 (1957).