Sidewall structure estimation from CD-SEM for lithographic process control

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5041, Issue , 2003, Pages 115-126

  Bingham, Philip R ^a   Price, Jeffery R ^a   Tobin, Kenneth W ^a   Karnowski, Thomas P ^a   Bennett, Marylyn H ^b   Bogardus, Hal ^b   Bishop, Michael ^b  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b SEMATECH   (United States)

Author keywords

Content based image retrieval; Critical dimension; Semiconductor Manufacturing; Sidewall Structure

Indexed keywords

COMPUTER SOFTWARE; CONTENT BASED RETRIEVAL; FEEDBACK CONTROL; IMAGE PROCESSING; LITHOGRAPHY; OPTICAL MICROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

CRITICAL DIMENSION (CD); SIDEWALL STRUCTURES;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0344928454     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485229     Document Type: Conference Paper

References (7)

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