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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 42, Issue 10 A, 2003, Pages

Study of Annealed NiO Thin Films Sputtered on Unheated Substrate

(5) Hotovy, Ivan a Liday, Jozef a Spiess, Lothar b Sitter, Helmut c Vogrincic, Peter a

a SLOVAK UNIVERSITY OF TECHNOLOGY (Slovakia)

b ILMENAU UNIVERSITY OF TECHNOLOGY (Germany)

c JOHANNES KEPLER UNIVERSITY LINZ (Austria)

Author keywords

Annealing; Crystalline; NiO; Reactive sputtering; Semiconductor

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; CRYSTAL STRUCTURE; HEAT CONDUCTION; MAGNETRON SPUTTERING; MORPHOLOGY; NICKEL COMPOUNDS; STRUCTURE (COMPOSITION); SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

CRYSTALLINE PHASES; REACTIVE SPUTTERING;

THIN FILMS;

EID: 0344272235 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.42.l1178 Document Type: Article

Times cited : (13)

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