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Volumn 77, Issue 5, 2003, Pages 485-488
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Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization
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Author keywords
[No Author keywords available]
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Indexed keywords
ASPECT RATIO;
CRYSTAL MICROSTRUCTURE;
DIFFRACTION;
LIGHT ABSORPTION;
PHOTOPOLYMERIZATION;
MICROCELL STRUCTURES;
NUMERICAL APERTURE;
PHOTON ABSORPTION;
SEMICONDUCTOR DEVICE MANUFACTURE;
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EID: 0344063655
PISSN: 09462171
EISSN: None
Source Type: Journal
DOI: 10.1007/s00340-003-1283-7 Document Type: Article |
Times cited : (18)
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References (16)
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