Basic investigations of an integrated modulator for plasma immersion ion implantation

Surface and Coatings Technology

Volumn 136, Issue 1-3, 2001, Pages 47-50

  Gunzel R ^a   Hornauer, U ^a   Rogozin, A I ^b   Astrelin, V T ^b  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b BUDKER INSTITUTE OF NUCLEAR PHYSICS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ANODES; ELECTRIC POTENTIAL; ION IMPLANTATION; PLASMA DENSITY;

PLASMA IMMERSION ION IMPLANTATION (PIII); PLASMA SOURCE ION IMPLANTATION (PSII);

PLASMA SOURCES;

EID: 0343831472     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(00)01009-4     Document Type: Article

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