Sheath dynamics in plasma immersion ion implantation

Surface and Coatings Technology

Volumn 85, Issue 1-2, 1996, Pages 98-104

  Gunzel R ^a   Brutscher, J ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Bohm; Plasma; Plasma immersion ion implantation; Plasma sheath

Indexed keywords

CALCULATIONS; CURRENT DENSITY; DYNAMICS; ELECTRIC CURRENTS; MATHEMATICAL MODELS; PLASMA APPLICATIONS; PLASMA SHEATHS; PLASMAS; PROBES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SURFACE PROPERTIES; SURFACE TREATMENT;

BOHM SHEATH CRITERION; ION FLUENCE; LANGMUIR PROBE; PLASMA IMMERSION ION IMPLANTATION; SHEATH DYNAMICS; SHEATH EXPANSION; TWO FLUID MODEL;

ION IMPLANTATION;

EID: 0030296024     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/0257-8972(96)02883-6     Document Type: Article

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