Imaging the absolute polar molecular orientation with monolayer sensitivity

Advanced Materials

Volumn 12, Issue 24, 2000, Pages 1918-1921

  Flörsheimer, Mathias ^a   Bootsmann, Maik Thomas ^a   Fuchs, Harald ^a  

^a UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; IMAGING TECHNIQUES; INTERFACES (MATERIALS); LANGMUIR BLODGETT FILMS; MOLECULAR BEAMS; MOLECULAR STRUCTURE; MONOLAYERS; SECOND HARMONIC GENERATION; SENSITIVITY ANALYSIS; THIN FILMS;

ORGANIC MOLECULAR BEAM DEPOSITION (OMBE);

MOLECULAR ORIENTATION;

EID: 0342592201     PISSN: 09359648     EISSN: None     Source Type: Journal    
DOI: 10.1002/1521-4095(200012)12:24<1918::AID-ADMA1918>3.0.CO;2-8     Document Type: Article

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