Pulsed Fowler-Nordheim current stress resistance of Si oxynitride grown with helicon-wave excited nitrogen-argon plasma

Journal of Applied Physics

Volumn 83, Issue 12, 1998, Pages 7685-7692

  Okamoto, Yoshinaga ^a   Kimura, Shinjiro ^a   Oka, Fumihito ^a   Tsuchiya, Shigehiro ^a   Ikoma, Hideaki ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342499067     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367890     Document Type: Article

References (12)

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