Fowler-Nordheim current-stress resistance of Si oxynitride grown in helicon-wave excited nitrogen-argon plasma

Journal of Applied Physics

Volumn 82, Issue 8, 1997, Pages 4108-4114

  Okamoto, Yoshinaga ^a   Ikoma, Hideaki ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343949451     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365722     Document Type: Article

References (11)

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