Investigation of the NO2 sensitivity properties of multiwalled carbon nanotubes prepared by plasma enhanced chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 5, 2003, Pages 1996-2000

  Valentini, L ^a   Cantalini, C ^b   Armentano, I ^a   Kenny, J M ^a   Lozzi, L ^b   Santucci, S ^b  

^a UNIVERSITY OF PERUGIA   (Italy)

^b UNIVERSITY OF L'AQUILA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SENSORS; ELECTRODES; NITROGEN OXIDES; PHOTOLITHOGRAPHY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON NITRIDE; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY;

MULTIWALLED CARBON NANOTUBE; PLATINUM INTERDIGITATE ELECTRODE; RESISTIVE GAS SENSOR;

CARBON NANOTUBES;

EID: 0242677575     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (26)

1. M.S. Dresselhaus, G. Dressehaus, and P.C. Eklund, Science of Fullenrenes and Carbon Nanotubes (Academic, New York, 1996), Chap. 19.
2. T. Ebbesen, Carbon Nanotube: Preparation and Properties (CRC, Boca Raton, FL, 1997).
3. R. Saito, G. Dressehaus, and M.S. Dresselhaus, Physics Properties of Carbon Nanotubes (World Scientific, New York, 1998).
4. J.P. Lu and J. Han, Int. J. High Electron. Syst. 9, 101 (1998).
5. A.C. Dillon, K.M. Jones, T.A. Bekkedhal, C.H. Kiang, D.S. Bethune, and M.J. Heben, Nature (London) 386, 377 (1997).
6. P. Chen, X. Wu, J. Lin, and K.L. Tan, Science 285, 91 (1999).
7. Y. Ye, C.C. Ahn, C. Witham, B. Fultz, J. Liu, A.G. Rinzler, D. Colbert, K. Smith, and R.E. Smalley, Appl. Phys. Lett. 74, 2307 (1999).
8. C. Liu, Y. Fan, M. Liu, H.T. Cong, H.M. Cheng, and M.S. Dresselhaus, Science 286, 1127 (1999).
9. Q.Y. Wang and J.K. Johnson, J. Chem. Phys. 110, 577 (1999).
10. J. Kong, N.R. Franklin, C. Zhou, M.G. Chapline, S. Peng, K. Cho, and H. Dai, Science 287, 622 (2000).
11. P.G. Collins, K. Bradley, M. Ishigami, and A. Zettl, Science 287, 1801 (2000).
12. G.U. Sumanasekera, C.K.W. Adu, S. Fang, and P.C. Eklund, Phys. Rev. Lett. 85, 1096 (2000).
13. A. Zahab, L. Spina, and P. Pomcharal, Phys. Rev. B 62, 10000 (2000).
14. H. Chang, J.D. Lee, S.M. Lee, and Y.H. Lee, Appl. Phys. Lett. 79, 3863 (2001).
15. A.G. Sumanasekera, B.K. Prahdan, H. Romero, and P. Eklund, Chem. Phys. Lett. 337, 31 (2001).
16. X.Y. Zhu, S.M. Lee, Y.H. Lee, and T. Frauenheim, Phys. Rev. Lett. 85, 2757 (2000).
17. L. Valentini, C. Cantalini, L. Lozzi, I. Armentano, J.M. Kenny, L. Ottaviano, and S. Santucci, Thin Solid Films 436, 95 (2003).
18. L. Valentini, J.M. Kenny, L. Lozzi, and S. Santucci, J. Appl. Phys. 92, 6188 (2002).
19. J.M. Holdon, P. Zhou, X. Bi, P.C. Eklund, S. Bandow, R.A. Jishi, K.D. Chowdhury, G. Dresselhaus, and M. Dresselhaus, Chem. Phys. Lett. 200, 186 (1994).
20. R.J. Nemanish and S.A. Solin, Phys. Rev. B 20, 392 (1979).
21. W. Zhou, S. Sun, D. Tang, Y. Li, Z. Liu, L. Ci, X. Zou, G. Wang, P. Tan, X. Dong, B. Xu, and B. Zhao, Appl. Phys. Lett. 80, 2553 (2002).
22. V.N. Popov, V.E. Van Doren, and M. Balkanski, Phys. Rev. B 59, 8355 (1999).
23. D.J. Bae, K.S. Kim, Y.S. Park, E.K. Suh, K.H. An, J. Moon, S.C. Lim, S.H. Park, Y.H. Jeong, and Y.H. Lee, Phys. Rev. B 64, 233401 (2001).
24. X. Wang, Y. Liu, G. Yu, C. Xu, J. Zhang, and D. Zhu, J. Phys. Chem. B 105, 9422 (2001).
25. L. Valentini, C. Cantalini, L. Lozzi, I. Armentano, J.M. Kenny, and S. Santucci, Appl. Phys. Lett. 82, 961 (2003).
26. J. Zhao, A. Buldum, J. Han, and J. Lu, Nanotechnology 13, 195 (2002).