Fabrication of 3-D Ni/Cu multilayered microstructure by selective etching of Ni

Journal of the Electrochemical Society

Volumn 150, Issue 11, 2003, Pages

  Arai, Susumi ^a   Hasegawa, Takahide ^a   Kaneko, Norio ^a  

^a SHINSHU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL MICROSTRUCTURE; DISSOLUTION; ELECTROPLATING; ETCHING; MORPHOLOGY; MULTILAYERS; NICKEL; PHOTOLITHOGRAPHY; SURFACES;

FILM DEPOSITION; MULTILAYERED MICROSTRUCTURE; OXIDATIVE DISSOLUTION; PLATING BATH;

ELECTROCHEMISTRY;

EID: 0242666143     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1617306     Document Type: Article

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