Pillar-lattice-assisted stress-free silicon-on-insulator

Applied Physics Letters

Volumn 83, Issue 16, 2003, Pages 3323-3325

  Haisma, Jan ^a,b  

^a PHILIPS RESEARCH LABORATORIES   (Netherlands)

^b NONE   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CRYSTAL DEFECTS; CRYSTAL LATTICES; LITHOGRAPHY; STRESS CORROSION CRACKING; TENSILE STRESS;

NANOIMPRINT LITHOGRAPHY;

SILICON ON INSULATOR TECHNOLOGY;

EID: 0242664840     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1620672     Document Type: Article

References (15)

1. J. Haisma and G. A. C. M. Spierings, Mater. Sci. Eng., R. 37, 1 (2002).
2. J. Haisma, G. A. C. M. Spierings, U. K. P. Biermann, and A. A. van Gorkum, J. Opt. Soc. Am. 33, 1154 (1994).
3. G. A. C. M. Spierings, J. Haisma, and Th. M. Michielsen, Philips J. Res. 49, 47 (1995).
4. M. Bruel, B. Aspar, and A.-J. Aubertun-Hervé, Jpn. J. Appl. Phys. 36. 1636 (1997).
5. Q.-Y. Tong, R. Scholz, U. Gösele, T.-H. Lee, L.-J. Huang, Y.-L. Chuo, and T. Y. Tan, Appl. Phys. Lett. 72, 49 (1998).
6. S. Y. Chou, P. R. Krauss, and P. J. Renstrom, Appl. Phys. Lett. 67, 3114 (1995).
7. J. Haisma, M. Verheijen, K. van den Heuvel, and J. van den Berg, J. Vac. Sci. Technol. B 14, 4124 (1996).
8. R. J. Jaceodine and W. A. Schlegel, J. Appl. Phys. 37, 2429 (1966).
9. J. Bagdahn, D. Katzer, M. Petzold, M. Wiemer, M. Alexe, V. Dragoi, and U. Gösele, Mater. Res. Soc. Symp. Proc. 681E. 1 (2001): MRS online publications at www.mrs.org
10. J. Haisma, J. J. C. Groenen, and P. W. de Haas. Philips J. Res. 49, 151 (1995): pp. 152-153.
11. B.-Y. Tsaur, J. C. C. Fan, and M. W. Gels, Appl. Phys. Lett. 40, 322 (1982).
12. K. Bulthuis, Philips Res. Rep. 20, 415 (1965).
13. K. Bulthuis, Philips Res. Rep. 23, 25 (1968).
14. H. Baumgart, T. J. Leuivic, and R. Egloff. Philips. J. Res. 49, 91 (1995).
15. R. Egloff, T. J. Letavic, B. Greenberg, and H. Baumgart. Philips J Res. 49 125 (1995).