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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5133, Issue , 2003, Pages 120-128

Ultra-trace analysis of light elements and speciation of minute organic contaminants on silicon wafer surfaces by means of TXRF in combination with NEXAFS

(13) Beckhoff, B a Fliegauf, R a Ulm, G a Weser, J a Pepponi, G b Streli, C b Wobrauschek, P b Ehmann, T c Fabry, L c Mantler, C c Pahlke, S c Kanngiesser B d Malzer, W d

a PHYSIKALISCH TECHNISCHE BUNDESANSTALT (Germany)

b TU WIEN (Austria)

c SILTRONIC AG (Germany)

d TECHNISCHE UNIVERSITÄT BERLIN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; IMPURITIES; RAMAN SCATTERING; SURFACE TREATMENT; SYNCHROTRON RADIATION;

VAPOR PHASE DECOMPOSITION (VPD);

SILICON WAFERS;

EID: 0242637369 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: None Document Type: Conference Paper

Times cited : (6)

References (10)

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