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Spectrochimica Acta - Part B Atomic Spectroscopy

Volumn 56, Issue 11, 2001, Pages 2085-2094

Synchrotron radiation induced total reflection X-ray fluorescence of low Z elements on Si wafer surfaces at SSRL - Comparison of excitation geometries and conditions

(7) Streli, C a Wobrauschek, P a Kregsamer, P a Pepponi, G a Pianetta, P b Pahlke, S c Fabry, L c

a TU WIEN (Austria)

b SLAC NATIONAL ACCELERATOR LABORATORY (United States)

c SILTRONIC AG (Germany)

Author keywords

Low Z elements; Si wafer surfaces; SR TXRF; Synchrotron radiation; Ultra trace levels

Indexed keywords

ULTRA TRACE LEVELS;

ELECTROMAGNETIC WAVE REFLECTION; FLUORESCENCE; MULTILAYERS; NONDESTRUCTIVE EXAMINATION; RADIATION DETECTORS; SYNCHROTRON RADIATION; X RAY ANALYSIS;

SILICON WAFERS;

EID: 0035976284 PISSN: 05848547 EISSN: None Source Type: Journal
DOI: 10.1016/S0584-8547(01)00322-6 Document Type: Article

Times cited : (13)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.