Effects of substrate temperature and near-substrate plasma density on the properties of dc magnetron sputtered aluminum doped zinc oxide

Journal of Applied Physics

Volumn 94, Issue 9, 2003, Pages 5514-5521

  Schmidt, Nathan W ^a   Totushek, Thomas S ^a   Kimes, William A ^a   Callender, David R ^a   Doyle, James R ^a  

^a MACALESTER COLLEGE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILM GROWTH; HALL EFFECT; PLASMA DENSITY; SUBSTRATES; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

PLASMA ACTIVATION; SUBSTRATE HEATING;

MAGNETRON SPUTTERING;

EID: 0242552150     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1615694     Document Type: Article

References (19)

1. For a recent review, see R. G. Gordon, MRS Bull. 25, 52 (2000).
2. M. Ruckh, D. Hariskos, U. Ruhle, H. W. Schock, R. Menner, and B. Dimmler, Proceedings of the 25th IEEE Photovoltaics Specialists Conference (1996), p. 825.
3. J. Lan and J. Kanicki, Mater. Res. Soc. Symp. Proc. 424, 347 (1997).
4. A. E. Delahoy and M. Cherny, Mater. Res. Soc. Symp. Proc. 426, 467 (1996).
5. R. Cebella, R. Wendt, and K. Ellmer, J. Appl. Phys. 83, 1087 (1998).
6. K. Ellmer, J. Phys. D 34, 3097 (2001).
7. B. Window and N. Savvides, J. Vac. Sci. Technol. A 4, 453 (1986).
8. R. P. Howson and H. A. Ja'fer, J. Vac. Sci. Technol. A 10, 1784 (1992).
9. I. Petrov, F. Adibi, J. E. Greene, W. D. Sproul, and W. D. Munz, J. Vac. Sci. Technol. A 10, 3283 (1992).
10. F. Adibi, I. Petrov, J. E. Greene, L. Hultman, and J. E. Sundgren, J. Appl. Phys. 73, 8580 (1993).
11. M. J. Brett and R. R. Parsons, Can. J. Phys. 63, 819 (1985).
12. G. L. Harding, B. Window, and E. C. Horrigan, Sol. Energy Mater. 22, 69 (1991).
13. T. Minami, H. Nanto, H. Sato, and S. Takata, Thin Solid Films 164, 275 (1988).
14. K. Ellmer and R. Wendt, Surf. Coat. Technol. 93, 21 (1997).
15. S. Jager, B. Szyszka, J. Szczyrbowski, and G. Brauer, Surf. Coat. Technol. 98, 1304 (1998).
16. J. Affinito and R. R. Parsons, J. Vac. Sci. Technol. A 2, 1275 (1984); B. Lipschultz, J. Hutchinson, B. LaBombard, and A. Wan, J. Vac. Sci. Technol. 15, 1810 (1986).
17. J. Affinito and R. R. Parsons, J. Vac. Sci. Technol. A 2, 1275 (1984); B. Lipschultz, J. Hutchinson, B. LaBombard, and A. Wan, J. Vac. Sci. Technol. 15, 1810 (1986).
18. B. Lipschultz, J. Hutchinson, B. LaBomard, and A. Wan, J. Vac. Sci. Technol. A 4, 1810 (1986).
19. R. M. Clements, J. Vac. Sci. Technol. 15, 193 (1978).