Evidence for two-phase regions in Ba0.5Sr0.5TiO 3 thin films from capacitance-voltage data

Applied Physics Letters

Volumn 83, Issue 16, 2003, Pages 3359-3361

  Jiang, A Q ^a   Scott, J F ^a   Sinnamon, L J ^b   Gregg, J M ^b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b QUEEN'S UNIVERSITY BELFAST   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CAPACITORS; ELECTRIC POTENTIAL; ELECTRODES; FERROELECTRICITY; PERMITTIVITY; PULSED LASER DEPOSITION;

FERROELECTRIC PHASE;

FERROELECTRIC THIN FILMS;

EID: 0242413124     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1621735     Document Type: Article

References (11)

1. D. E. Kotecki, Integr. Ferroelectr. 16, 1 (1997).
2. F. De. Flaviis, N.-G. Alexopoulos, and O. M. Stafsudd, IEEE Trans. Microwave Theory Tech. 45, 963 (1997).
3. L. J. Sinnamon, R. M. Bowman, and J. M. Gregg, Appl. Phys. Lett. 78, 1724 (2001).
4. L. J. Sinnamon, R. M. Bowman, and J. M. Oregg, Appl. Phys. Lett. 81, 889 (2002).
5. E. J. Kim, S. H. Oh, and H. M. Jang, Appl. Phys. Lett. 75, 3195 (1999).
6. E. D. Specht, H.-M. Christen, D. P. Norton, and L. A. Boatner, Phys. Rev. Lett. 80, 4317 (1998).
7. O. Tikhomirov, H. Jiang, and J. Levy, Phys. Rev. Lett. 89, 147601 (2002).
8. A. Q. Jiang, J. F. Scott, C. Wang, P. Migliorato, and J. M. Gregg, Jpn. J. Appl. Phys. (in press).
9. R. J. Cava, W. F. Peck, J. J. Krajewski, and D. A. Fleming, Appl. Phys. Lett. 67, 3813 (1995).
10. C. Li, Z. Chen. D. Cui, Y. Zhou, H. Lu, C. Dong, F. Wu, and H. Chen, J. Appl. Phys. 86, 4555 (1999).
11. A. A. Baski, W. F. Oliver, and J. F. Scott, Ferroelectrics 7, 171 (1987).