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Volumn 50, Issue 11, 2003, Pages 2248-2254

Current Mismatch Due to Local Dopant Fluctuations in MOSFET Channel

Author keywords

Matching; MOSFETs; Semiconductor device doping; Semiconductor device modeling

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC IMPEDANCE; ELECTRIC POTENTIAL; SEMICONDUCTOR DOPING;

EID: 0242332714     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2003.818282     Document Type: Article
Times cited : (40)

References (9)
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    • Dec
    • K. R. Lakshimikumar, R. A. Hadaway, and M. A. Copeland, "Characterization and modeling of mismatch in MOS transistors for precision analog design," IEEE J. Solid-State Circuits, vol. 21, pp. 1057-1066, Dec. 1986.
    • (1986) IEEE J. Solid-state Circuits , vol.21 , pp. 1057-1066
    • Lakshimikumar, K.R.1    Hadaway, R.A.2    Copeland, M.A.3
  • 3
    • 0033307322 scopus 로고    scopus 로고
    • A comprehensive MOSFET mismatch model
    • P. G. Drennan and C. C. McAndrew, "A comprehensive MOSFET mismatch model," in IEDM Tech. Dig., 1999, pp. 167-170.
    • (1999) IEDM Tech. Dig. , pp. 167-170
    • Drennan, P.G.1    McAndrew, C.C.2
  • 4
    • 0036054266 scopus 로고    scopus 로고
    • Understanding MOSFET mismatch for analog design
    • _, "Understanding MOSFET mismatch for analog design," in Proc. IEEE Custom Integrated Circuits Conf., 2002, pp. 449-452.
    • (2002) Proc. IEEE Custom Integrated Circuits Conf. , pp. 449-452
  • 5
    • 0028548950 scopus 로고
    • Experimental study of threshold voltage fluctuation due to statistical variation of channel dopant number in MOSFET's
    • Nov
    • T. Mizuno, J.-I. Okamura, and A. Toriumi, "Experimental study of threshold voltage fluctuation due to statistical variation of channel dopant number in MOSFET's," IEEE Trans. Electron Devices, vol. 41, pp. 2216-2221, Nov. 1994.
    • (1994) IEEE Trans. Electron Devices , vol.41 , pp. 2216-2221
    • Mizuno, T.1    Okamura, J.-I.2    Toriumi, A.3
  • 6
    • 0030084540 scopus 로고    scopus 로고
    • Influence of statistical spatial-nonuniformormity of dopant atoms on threshold voltage in a system of many MOSFET's
    • T. Mizuno, "Influence of statistical spatial-nonuniformormity of dopant atoms on threshold voltage in a system of many MOSFET's," Jpn. J. Appl. Phys., vol. 35, pp. 842-848, 1996.
    • (1996) Jpn. J. Appl. Phys. , vol.35 , pp. 842-848
    • Mizuno, T.1
  • 9
    • 0035249596 scopus 로고    scopus 로고
    • Physical origin of the excess thermal noise in short channel MOSFETs
    • Feb
    • J.-S.Jung-Suk Goo et al., "Physical origin of the excess thermal noise in short channel MOSFETs," IEEE Electron Device Lett., vol. 22, pp. 101-103, Feb. 2001.
    • (2001) IEEE Electron Device Lett. , vol.22 , pp. 101-103
    • Goo, J.-S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.