Resistivity and Microstructure Issues in Indium-Oxide Based Films Grown by RF Magnetron Sputtering on Flexible Polyester Substrates

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2003, Pages 195-199

  Carcia, P F ^a   McLean, R S ^a   Reilly, M H ^a   Li, Z G ^a   Pillione, L J ^b   Messier, R F ^b  

^a DUPONT COMPANY   (United States)

^b Materials Research Institute   (United States)

Author keywords

Indium oxide; Indium tin oxide; Polyester substrates; Sputter deposition

Indexed keywords

INDIUM COMPOUNDS; MAGNETRON SPUTTERING; MICROSTRUCTURE; PARTIAL PRESSURE; POLYESTERS;

POLYESTER SUBSTRATES;

FILM GROWTH;

EID: 0242290780     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (15)

1. R.B.H. Tahar, T. Ban, Y. Ohya, and Y. Takahashi, "Tin doped indium oxide thin films: Electrical properties," J. Appl. Phys. 83, 2631(1998).
2. I. Hamberg and C. G. Granqvist, "Evaporated Sn-doped In2O3 films: Basic optical properties and applications to energy-efficient windows," J. Appl. Phys. 60, R123 (1986)
3. Z.M. Jarzebski, "Preparation and Physical Properties of Transparent Conducting Oxide Films," Phys. Stat. Sol. (a) 71, 13 (1982).
4. E.G. Lewis and D.C. Paine, "Applications and Processing of Transparent Conducting Oxides," MRS Bulletin 25, 22 August, 2000.
5. L.J. van der Pauw, "A method of measuring specific resistivity and Hall effect of discs of arbitrary shape," Philips Res. Repts. 13, 1 (1958).
6. S. Ishibashi, Y. Higuchi, Y. Ohta, and K. Nakamura, " Low resistivity indium-tin oxide transparent conductive films, II. Effect of sputtering voltage on electrical property of films," J. Vac. Sci. Technol. A 8, 1403 (1990).
7. Y. Shigesato, S. Takaki, and T. Haranoh, "Electrical and structural properties of low resistivity tin-doped indium oxide films," J. Appl. Phys. 71, 3356 (1992).
8. Y. Hoshi and R. Ohki, "Low energy rf sputtering system for the deposition of ITO thin films," Electrochimica Acta 44, 3927 (1999).
9. P.F. Carcia, R.S. McLean, M. H. Reilly, Z.G. Li, L.J. Pillione, and R.F. Messier, "Low stress indium-tin-oxide thin films rf magnetron sputtered on polyester substrates," Appl. Phys. Lett. 81, 1800 (2002).
10. S. K. Choi and J.I. Lee, "Effect of film density on electrical properties of indium tin oxide films deposited by dc magnetron reactive sputtering," J. Vac. Sci. Technol. A 19, 2043 (2001).
11. S. Bhagwatand R. P. Howson, "Use of the magnetronsputtering technique for control of the properties of indium tin oxide thin films," Surf. Coatings Technol. 111, 163 (1999).
12. T. J. Vink, W. Walrave, J. L. C. Daams, P. C. Baarslag, J. E. A. A. van den Meerakker, "On the homogeneity of sputter-deposited ITO films Parti: Stress and microstructure," Thin Solid Films 266, 145 (1995).
13. P.P. Carcia, R.S..McLean, M. H. Reilly, Z.G. Li, L.J. Pillione, and R.F. Messier, "Influence of energetic bombardment on stress, resistivity, and microstructure of ITO films grown by rf magnetron sputtering on flexible polyester substrates," to be published in J. Vac. Si. Technol. A 2003.
14. D. C. Paine, T. Whitson, D. Janiac, R. Beresford, C.O. Yang, and B. Lewis, "A study of low temperature crystallization of amorphous thin film indium-tin-oxide," J. Appl. Phys. 85, 8445 (1999).
15. J. R. Bellingham, W. A. Phillips,and C. J. Adkins, "Electrical and optical properties of amorphous indium oxide," J. Phys. Condens. Matter. 2, 6207 (1990).