Electron lifetimes in image-potential states at metal-dielectric interfaces

Progress in Surface Science

Volumn 74, Issue 1-8, 2003, Pages 219-237

  Machado, M ^a   Chulkov, E V ^a,b   Silkin, V M ^b   Hofer U ^c   Echenique, P M ^a,b  

^a UNIVERSITY OF THE BASQUE COUNTRY UPV EHU   (Spain)

^b CSIC   (Spain)

^c PHILIPPS UNIVERSITY MARBURG   (Germany)

Author keywords

Argon; Cu(1 0 0); Dielectric adsorbates; Image states; Lifetime; Many body calculations

Indexed keywords

ARGON; BINDING ENERGY; DIELECTRIC MATERIALS; ELECTRON ENERGY LEVELS; GAS ADSORPTION; INTERFACES (MATERIALS); SURFACE STRUCTURE;

METAL-DIELECTRIC INTERFACES;

COPPER;

EID: 0242270821     PISSN: 00796816     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.progsurf.2003.08.019     Document Type: Conference Paper

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