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Materials Research Society Symposium-Proceedings

Volumn 621, Issue , 2000, Pages Q531-Q537

Very low field electron emission from hot filament CVD grown microcrystalline diamond

(6) Satyanarayana, B S a,b Peng, X L a,c Adamopoulos, G a Robertson, J a Milne, W I a Clyne, T W a

a UNIVERSITY OF CAMBRIDGE (United Kingdom)

b KOCHI UNIVERSITY OF TECHNOLOGY (Japan)

c UNIVERSITY OF WISCONSIN MADISON (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CONCENTRATION (PROCESS); CURRENT DENSITY; ELECTRON EMISSION; FILM GROWTH; POLYCRYSTALLINE MATERIALS;

HOT FILAMENTS;

DIAMOND FILMS;

EID: 0034428444 PISSN: 02729172 EISSN: None Source Type: Journal
DOI: 10.1557/proc-621-q5.3.1 Document Type: Article

Times cited : (16)

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