SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 70, Issue 2-4, 2003, Pages 392-397

Reactively sputtered tantalum pentoxide thin films for integrated capacitors

(2) Riekkinen, T a Molarius, J a

a VTT TECHNICAL RESEARCH CENTRE OF FINLAND (Finland)

Author keywords

Reactive sputtering; Ta 2O5; Tantalum pentoxide; Thin film capacitor

Indexed keywords

CAPACITORS; DEPOSITION; DIELECTRIC AMPLIFIERS; FREQUENCIES; MAGNETRON SPUTTERING; MIM DEVICES; Q FACTOR MEASUREMENT; STOICHIOMETRY; TANTALUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

INTEGRATED CAPACITORS;

THIN FILMS;

EID: 0142118478 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/S0167-9317(03)00384-8 Document Type: Conference Paper

Times cited : (16)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.