Study of the cross-sectional profile in selective formation of porous silicon

Applied Physics Letters

Volumn 83, Issue 13, 2003, Pages 2710-2712

  Kim, Han Su ^a   Chong, Kyuchul ^a   Xie, Ya Hong ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; ELECTRIC CONDUCTIVITY OF SOLIDS; MASKS; SILICON NITRIDE;

MASK MATERIALS;

SEMICONDUCTING FILMS;

EID: 0142057235     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1613995     Document Type: Article

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