Plasma load characteristics of pulsed-bias arc ion plating

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 5, 2003, Pages 1675-1679

  Lin, Guoqiang ^a   Ding, Zhenfeng ^a   Qi, Dong ^a   Zhao, Yanhui ^a   Wang, Ninghui ^a   Dong, Chuang ^a   Huang, Rongfang ^b   Wen, Lishi ^b  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b INSTITUTE OF METAL RESEARCH   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; ELECTRIC NETWORK ANALYSIS; OSCILLATIONS; PLASMAS; RESISTORS;

ARC ION PLATING (AIP);

ION IMPLANTATION;

EID: 0142055997     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1597890     Document Type: Conference Paper

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