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Surface and Coatings Technology

Volumn 160, Issue 1, 2002, Pages 93-98

Substrate bias effects in plasma immersion ion implantation assisted deposition from a TiAl cathodic arc

(5) Mukherjee, S a Reuther, H a Prokert, F a Richter, E a Moeller, W a

a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH (Germany)

Author keywords

PIIIAD; Pulsed biasing; TRIDYN

Indexed keywords

APPROXIMATION THEORY; DEPOSITION; ION IMPLANTATION; STAINLESS STEEL; SUBSTRATES;

CATHODIC ARC;

THIN FILMS;

CATHODIC ARC PLASMA DEPOSITION; FILM; ION IMPLANTATION; STAINLESS STEEL;

EID: 0036785346 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(02)00376-6 Document Type: Article

Times cited : (17)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.