Formation of high temperature phases in sputter deposited Ti-based films below 100 °C

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2247-2250

  Musil, J ^a   Bell, A J ^a   Vlcek J ^b   Hurkmans, T ^c  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

^c Hauzer Techno Coating BV   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0003570816     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580055     Document Type: Article

References (6)

1. J. Musil, J. Vlček, V. Ježek, M. Kolega, and R. Boomsna, Surf. Coat. Technol. 76, 274 (1995).
2. J. Musil, J. Matous, and V. Valvoda, Vacuum 46, 203 (1995).
3. R. Birringer, Mater. Sci. Eng. A 117, 33 (1989).
4. A. Nakayama, T. Yoshioka, and T. Nomura, in Surface Modification Technologies VII, Proceedings of the Seventh International Conference, edited by T. S. Sudarsham, K. Ishizakin, M. Takata, and K. Kamata, 31 October-2 November 1993 (Institute of Materials, 1994), pp. 315-325.
5. S. Vepřek, S. Reiprich, and L. Shizi, Appl. Phys. Lett. 66, 2640 (1995).
6. P. Duwez and J. L. Taylor, Trans. ASM 44, 495 (1952).