Metallic adhesion and tunnelling at the atomic scale

New Journal of Physics

Volumn 2, Issue , 2000, Pages

  Schirmeisen, A ^a   Cross, G ^a,b   Stalder, A ^a,c   Grutter P ^a   Durig U ^b  

^a MCGILL UNIVERSITY   (Canada)

^b IBM RESEARCH ZURICH   (Switzerland)

^c iT security AG   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141937005     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/2/1/329     Document Type: Article

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