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Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities
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T. F. Edgar, S. Butler, W. J. Campbell, C. Pfeiffer, C. Bode, S. B. Hwang, K. S. Balakrishnan, and J. Hahn, "Automatic control in microelectronics manufacturing: Practices, challenges, and possibilities," Automatica, vol. 36, no. 11, pp. 1567-1603, 2000.
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Finite-time tracking with actuator saturation: Application to RTF temperature trajectory following
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A. Emami-Naeini, G. M. Kabuli, and R. L. Kosut, "Finite-time tracking with actuator saturation: Application to RTF temperature trajectory following," in Proc. Conf, Decision Control, Dec. 1994, pp. 73-78.
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Proc. Conf, Decision Control
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Emami-Naeini, A.1
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0141524346
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Modeling of radiation heat transfer and wafer temperatures in a complex three-dimensional rapid thermal processing chamber
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Aug.
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K. L. Knutson, T. P. Merchant, J. V. Cole, J. P. Hebb, T. G. Mihopoulos, and K. F. Jensen, "Modeling of radiation heat transfer and wafer temperatures in a complex three-dimensional rapid thermal processing chamber," in Proc. 2nd Int. Rapid Thermal Processing Conf., Aug. 1994, pp. 146-152.
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5
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0141858952
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Thermal modeling of rapid thermal processing systems
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R. B. Fair and B. Lojek, Eds., Amsterdam, The Netherlands
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J. L. Ebert, A. Eniami-Naeini, and R. L. Kosut, "Thermal modeling of rapid thermal processing systems," in Proc. 3rd Int. Rapid Thermal Processing Conf., R. B. Fair and B. Lojek, Eds., Amsterdam, The Netherlands, 1995, pp. 343-355.
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Proc. 3rd Int. Rapid Thermal Processing Conf.
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Ebert, J.L.1
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9
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0141859001
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A GUI-based concurrent software tool for thermal modeling and control system design for RTP chambers
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191st Meeting Electrochemical Soc., Montreal, QC, Canada, May 4-9
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S. Ghosal, J. L. Ebert, K. Chung, G. Aral, and A. Emami-Naeini, "A GUI-based concurrent software tool for thermal modeling and control system design for RTP chambers," presented at the 2nd Symp. Process Control, Diagnostics, Modeling in Semiconductor Manufacturing, 191st Meeting Electrochemical Soc., Montreal, QC, Canada, May 4-9,1997.
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2nd Symp. Process Control, Diagnostics, Modeling in Semiconductor Manufacturing
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Ghosal, S.1
Ebert, J.L.2
Chung, K.3
Aral, G.4
Emami-Naeini, A.5
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10
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0031389082
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Efficient CFD modeling of single wafer semiconductor systems for closed-loop evaluation
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Dec.
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J. L. Ebert, G. W van der Linden, R. L. Kosut, and A. Emami-Naeini, "Efficient CFD modeling of single wafer semiconductor systems for closed-loop evaluation," in Proc. 36th IEEE Conf. Decision Control, Dec. 1997, pp. 830-831.
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Proc. 36th IEEE Conf. Decision Control
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Ebert, J.L.1
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11
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Efficient CFD modeling of single wafer systems for closed-loop evaluation
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_, "Efficient CFD modeling of single wafer systems for closed-loop evaluation," in Proc. 5th Int. Conf. Advanced Thermal Processing Semiconductors, Sept. 1997, pp. 279-282.
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Proc. 5th Int. Conf. Advanced Thermal Processing Semiconductors
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12
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0028756635
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Improving static performance robustness of thermal systems
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Dec.
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M. G. Kabuli.,R. L. Kosut, and S. Boyd, "Improving static performance robustness of thermal systems," in Proc. 1994 IEEE Conf. Decision Control, Dec. 1994, pp. 62-66.
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Proc. 1994 IEEE Conf. Decision Control
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Kabuli, M.G.1
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Thermal modeling and control of rapid thermal processing systems
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Dec
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J. L. Ebert, A. Emami-Naeini, H. Aling, and R. L. Kosut, "Thermal modeling and control of rapid thermal processing systems," in Proc. 34th IEEE Conf., Dec 1995, pp. 1304-1309.
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Proc. 34th IEEE Conf.
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Ebert, J.L.1
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16
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0001739371
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Low dimensional description of complicated phenomena
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L. Sirovich and C. H. Sirovich, "Low dimensional description of complicated phenomena," Contemporary Mathematics; vol. 99, pp. 277-305, 1989.
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Contemporary Mathematics
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Application of singular value methods for identification and model based control of distributed parameter systems
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Nonlinear model reduction for simulation and control of rapid thermal processing
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H. Aling, S. Banerjee, A. K. Bangia, V. Cole, J. Ebert, A. Emami-Naeini, K. F. Jensen, I. G. Kevrekidis, and S. Shvartsman, "Nonlinear model reduction for simulation and control of rapid thermal processing," in Proc. Automatic Control Conf., June 1997.
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Application of a nonlinear model reduction method to rapid thermal processing (RTP) reactors
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Nonlinear model reduction for simulation and control of rapid thermal processing
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June
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H. Aling, A. Emami-Naeini, R. L. Kosut, and J. L. Ebert, "Nonlinear model reduction for simulation and control of rapid thermal processing," in Proc. American Control Conf., June 1997, pp. 2233-2238.
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H. Aling, J. Abedor, J. L. Ebert, A. Emami-Naeini, and R. L. Kosut, "Application of feedback linearization to models of rapid thermal processing (RTP) reactors," in RTP'95, Aug. 1995, pp. 356-366.
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Upper Saddle River, NJ: Prentice-Hall
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G. F. Franklin, J. D. Powell, and A. Emami-Naeini, Feedback Control of Dynamic Systems, 4th ed. Upper Saddle River, NJ: Prentice-Hall, 2002.
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Feedback Control of Dynamic Systems, 4th Ed.
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Franklin, G.F.1
Powell, J.D.2
Emami-Naeini, A.3
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31
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4243893425
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Command shaping for MIMO nonlinear systems using iterative learning control with application to an RTF system
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Nov.
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D. de Roover, A. Emami-Naeini, J. L. Ebert,.and R, L. Kosut, "Command shaping for MIMO nonlinear systems using iterative learning control with application to an RTF system," in Proc. ASME Dyn. Syst. Control Divison-2000, vol. DSC-69-1, Nov. 2000, pp. 153-161.
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0141747468
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Improved performance of a fast-ramp RTA system through recipe and controller optimization
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Toronto, ON, Canada
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Tradeoffs in temperature control of fast-ramp RTO and RTA systems
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Colorado Springs, CO, Sept
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D. de Roover, A. Emami-Naeini, J. L. Ebert, and R. L. Kosut, "Tradeoffs in temperature control of fast-ramp RTO and RTA systems," presented at the 7th Int. Conf. Advanced Thermal Processing Semiconductors, Colorado Springs, CO, Sept 1999.
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7th Int. Conf. Advanced Thermal Processing Semiconductors
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Model-based control of fast-ramp RTP systems
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D. de Roover, A. Emami-Naeini, J. L. Ebert, S. Ghosal, and G. W. Linden, "Model-based control of fast-ramp RTP systems," in Proc. 6th Int. Conf. Advanced Thermal Processing of Semiconductors, Sept. 1998, pp. 177-186.
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Proc. 6th Int. Conf. Advanced Thermal Processing of Semiconductors
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De Roover, D.1
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35
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0032259997
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Run-to-Run control of static systems
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Dec.
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R. L. Kosut, D. de Roover, A. Emami-Naeini, and J. L. Ebert, "Run-to-Run control of static systems," in Proc. 37th IEEE Conf. Decision Control, Dec. 1998, pp. 695-700
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Proc. 37th IEEE Conf. Decision Control
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Kosut, R.L.1
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36
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0031337054
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Real-time model-based control systems design for gelcast drying process
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Hartford, CT, Oct. 5-7
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Y. P. Harn, S. Ghosal, G. Aral, A. Emami-Naeini, B. Draskovich, and L. C. Maxey, "Real-time model-based control systems design for gelcast drying process," in Proc. 1997 IEEE Int. Conf. Control Applications, Hartford, CT, Oct. 5-7, 1997.
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(1997)
Proc. 1997 IEEE Int. Conf. Control Applications
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Harn, Y.P.1
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Aral, G.3
Emami-Naeini, A.4
Draskovich, B.5
Maxey, L.C.6
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37
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0032687490
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A physical model for drying gelcast ceramics
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Mar.
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S. Ghosal, A. Emami-Naeini, Y. P. Harn, B. Draskovich, and J. P. Pollinger, "A physical model for drying gelcast ceramics," J. Amer. Ceramic Soc., pp. 513-520, Mar. 1999.
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J. Amer. Ceramic Soc.
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Ghosal, S.1
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38
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0141635488
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RTP robust control design, part I: Sensitivity analysis
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Sept.
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M. Refai, J. L. Eben, A. Emami-Naeini, and R. L. Kosut, "RTP robust control design, part I: sensitivity analysis," in Proc. RTP'96, Sept. 1996.
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Proc. RTP'96
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Refai, M.1
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Control of rapid thermal processing: A system theoretic approach
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Temperature control of MMST RTP: Repeatability, uniformity, and integration for flexible manufacturing
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