The problem with submicrometer linewidth standards, and a proposed solution

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4344, Issue , 2001, Pages 139-146

  Potzick, J ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Error; Imaging; Linewidth; Measurement uncertainty; Metrology; Standards; Tolerance; Traceability

Indexed keywords

ELECTRON MICROSCOPES; ERROR ANALYSIS; IMAGING SYSTEMS; MICROELECTRONIC PROCESSING; OPTICAL MICROSCOPY; OPTICAL RESOLVING POWER; WSI CIRCUITS;

TRACEABLE LINEWIDTH MEASUREMENTS;

MASKS;

EID: 0034763995     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.436737     Document Type: Conference Paper

References (6)

1. Accuracy in integrated circuit dimensional measurements
2. Photomask metrology in the era of neolithography