Progress of study on vanadium dioxide and sesquioxide

Chinese Journal of Inorganic Chemistry

Volumn 19, Issue 2, 2003, Pages 113-118

  He, Shan ^a   Wei, Liu Ya ^a   Fu, Qun ^a   Lin, Chen ^a   Lei, De Ming ^a   Zheng, Chen Mou ^a  

^a SUN YAT SEN UNIVERSITY   (China)

Author keywords

Preparation; Properties; Vanadium dioxide; Vanadium sesquioxide

Indexed keywords

UNCLASSIFIED DRUG; VANADIUM DERIVATIVE; VANADIUM DIOXIDE; VANADIUM SESQUIOXIDE;

CERAMICS; ELECTRICITY; FILM; HEAT SENSITIVITY; MAGNETISM; POWDER; REVIEW;

EID: 0141628672     PISSN: 10014861     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Review

References (59)

1. Morin F. Phys. Rev. Lett., 1959, 13(1), 34.
2. Kucharczyk D., Niklewski T. J. Appl. Cryst., 1979, 12, 370.
3. Nii J., Wakihara M., Taniguchi M. Mat. Res. Bull., 1979, 14, 1069.
4. Hörlin T., Niklewski T., Nygren M. Mat. Res. Bull., 1973, 8, 179.
5. Borek M., Qian F., Nagabushnam V. et al Appl. Phys. Lett., 1993, 63, 3288.
6. Case F. C. J. Vac. Sci. Technol., 1984, A2, 1509.
7. Lu S., Hou L., Gam F. J. Mater. Sci., 1993, 28, 2169.
8. Fukuma M., Zembutsu S., Miyazawa S. Appl. Opt., 1983, 22, 265.
9. Yethirai M. J. Solid State Chem., 1990, 88, 53.
10. Kokabi H. R., Papeaux M., Aymami J. A. et al Mater. Sci. Eng. B, 1996, 38, 80.
11. Joshi G. M., Honig J. M. Rev. Chim. Miner., 1982, 251.
12. Suzuki T., Ogino M., Yoshizawa T. et al Adv. Sci. Technol., 1999, 17, 135.
13. Bando Y., Kyoto M., Takad T. et al J. Cryst. Growth, 1978, 45, 20.
14. Kimizuka N., Isahii M., Kawada M. et al J. Solid State Chem., 1974, 9, 69.
15. Oppermann H., Reichelt M., Gerlach U. et al Phys. State Solid (A), 1975, 28, 439.
16. Hörlin T., Niklewski T., Nygren M. Acta Chem. Scand. A, 1976, 30, 619.
17. Ivon A. I., Kolbunov V. R., Chernenko I. M. Inorg. Mater., 1996, 32, 555.
18. Abraham K. M., Goldman J. L., Dempsey M. D. J. Electrochem. Soc.: Electrochem. Sci. Technol., 1981, 128, 2493.
19. Murphy D. W., Christain P. A., Disalvo F. J. et al J. Electrochem. Soc.: Electronchem. Sci. Technol., 1981, 128, 2053.
20. Lawtow S. A., Theby E. A. J. Am. Ceram. Soc., 1995, 78, 104.
21. Tsang C., Manthiram A. J. Electrochem. Soc., 1997, 144, 520.
22. YIN Da-Chuan, WANG Meng, HUANG Wei-Dong Xibei Gongye Daxue Xuebao (J. Northwest Univ. Tech.), 1999, 17, 493.
23. Toshiyuki O., Yasuhiro I., Kenkyu K. R. J. Photopolym. Sci. Technol., 1997, 10, 211.
24. Mak T. C. W., Li P., Zhang C. et al J. Chem. Soc., Chem. Commun., 1986, 1597.
25. Zheng C., Zhang J., Luo G. et al J. Mater. Sci., 2000, 35, 3425.
26. Zheng C., Zhang X., Zhang J. et al J. Solid State Chem., 2001, 156, 274.
27. Brückner W., Moldenhauer W., Wich H. et al Phys. State Sol. (A), 1975, 29, 63.
28. Partlow D. P., Gukovich S. R., Radford K. C. et al J. Appl. Phys., 1991, 70, 443.
29. Chen S., Hahn J., Rice C. E. et al J. Solid State Chem., 1982, 44, 192.
30. Keer H. V., Pickerson D. L., Kuwamoto H. et al J. Solid State Chem., 1976, 19, 95.
31. Piao J., Takahashi S., Kohiki S. Jpn. J. Appl. Phys. Part. 1, 1998, 37, 6519.
32. Mcwhan D. B., Remeika J. P. Phys. Rev. B, 1970, 2, 3734.
33. Du W., Du H. Chin. Sci. Bull., 1992, 37, 1929.
34. Sullivan R. J., Srinivasan T. T., Newnham R. E. J. Am. Ceram. Soc., 1990, 73, 3715.
35. Wu J., Liu H., Zhu S., Ma Z. Chin. Chem. Lett., 1991, 2, 901.
36. Kittaka S., Sasaki S., Morimoto T. J. Mater. Sci., 1987, 22, 557.
37. YANG Zhao-Hui, LUO Yu-Ji, ZHENG Chen-Mou, ZHANG Jin-Xiu Cailiao Kexue Jinzhan (Chinese Mater. Sic. Prog.), 1991, 5, 342.
38. Ion A. I., Kolbunov V. R., Chernenko I. M. J. Eur. Ceram. Soc., 1999, 19, 1883.
39. Ion A. I., Kolbunov V. R., Chernenko I. M. Inorg. Mater., 2000, 36, 88.
40. Kuöma E. Electron. Technol., 1993, 26, 129.
41. McWhan D. B., Remeika J. P. Phys. Rev. B, 1970, 2, 3734.
42. Yethiraj M., Werner S. A., Yelon W. B. Phys. 136 B, 1986, 458.
43. Perkings R. S., Rüegg A., Fisher M. Adv. Ceram., 1983, 7, 166.
44. Thans H., Honig J. M. J. Solid State Chem., 2000, 159, 41.
45. Nomura T., Yoshino H., Fukushima S. et al JP 86, 220, 404.
46. Tanaka M., Nakajima Y., Haba H. JP 94, 151, 108.
47. Hendrix B. C., Wang X., Chen W. et al J. Mater. Sci.: Mater. Electron, 1992, 3, 113.
48. CHEN Wen, XU Qing, CUI Wan-Qiu Wuhan Gongye Daxue Xuebao (J. Wuhan Univ. Tech.), 1994, 16, 18.
49. CHEN Wen, XU Qing, CUI Wan-Qiu Gongneng Cailiao (Chinese Function Mater.), 1995, 26, 442.
50. Nobuo O. J. Solid State Chem., 1982, 45, 241.
51. ZHENG Chen-Mou, LUO Yi-Ji, HUANG Kun-Yao Wuji Cailiao Xuebao (Chinese J. Inorg. Mater.), 1996, 11, 621.
52. YUAN Ning-Yi, LI Jin-Hua, LIN Cheng-Lu Gongneng Cailiao (Chinese Function Mater.), 2001, 32, 572.
53. Kavanagh K. L., Naguib H. M. Thin. Solid Films, 1982, 91, 231.
54. Guinneton F., Sauqes L., Valmalette J.-C. et al J. Phys. Chem. Solid, 2001, 62, 1229.
55. Guinneton F., Valmaletee J. -C., Gavarri J. R. Opt. Mater., 2000, 15, 111.
56. Case F. C. J. Vac. Sci. Technol., 1984, A2, 1509.
57. Tazawa M., Jin P., Tanemura S. Appl. Opt., 1998, 37, 1858.
58. Jin P., Tazawa M., Yoshimura K. et al Thin Solid Films, 2000, 375, 128.
59. Yamaguchi I., Manabe T., Kumagai T. et al Thin Solid Films, 2000, 366, 294.