Comparison of pattern placement errors as measured using traditional overlay targets and design rule structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 49-60

  Leray, Philippe ^a   Laidler, David ^a   Pollentier, Ivan ^a  

^a IMEC   (Belgium)

Author keywords

CD SEM overlay metrology; Distortion; Overlay; Pattern placement error; Precision

Indexed keywords

ABERRATIONS; ALGORITHMS; CALCULATIONS; LENSES; MASKS; SCANNING ELECTRON MICROSCOPY; SILICON WAFERS;

ALTERNATIVE METROLOGY TECHNIQUE; OVERLAY METROLOGY; PATTERN PLACEMENT ERROR;

OPTICAL VARIABLES MEASUREMENT;

EID: 0141612798     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482817     Document Type: Conference Paper

References (5)

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3. D. Laidler, H. Megens, S. Lalbahadoersing, R. van Haren, F. Bornebroek, "Advances in process overlay - ATHENA™ alignment system performance on critical process layer", SPIE 2002, 4689-43.
4. A.R. Neureuther, C.A. Mack, "Handbook of Microlithography, Micromachining and Microfabrication", Vol. 1., pp 608-609, 1997.
5. T.A. Brunner, "Impact of lens aberrations on optical lithography", IBM Journal of Research and Development, Vol. 41, pp 57-67.