A new generation of bottom anti-reflective coatings (BARCs): Photodefinable BARCs

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 I, Issue , 2003, Pages 129-135

  Guerrero, Douglas J ^a   Trudgeon, Tonya ^a  

^a BREWER SCIENCE INC   (United States)

Author keywords

BARCs; Patternable; Photodefinable; Wet developable

Indexed keywords

CASTING; CURING; PHOTORESISTS; PHOTOSENSITIVITY; POLYCARBONATES; SOLUBILITY; SOLVENTS; THERMODYNAMIC STABILITY; ULTRAVIOLET RADIATION;

BOTTOM ANTI-REFLECTIVE COATINGS; HYBRID CARBONATE-SULFONES; POLYSULFONYL ESTERS;

ANTIREFLECTION COATINGS;

EID: 0141500031     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483726     Document Type: Conference Paper

References (8)

1. C. K. Harnett, K. M. Satyalakshmi, G. W. Coates, and H. G. Craighead, "Direct Electron-Beam Patterning of Surface Coatings and Sacrificial Layers for Micro-Total Analysis Systems", J. Photopolymer Sci. & Tech., 15 (3), 493-496, 2002.
2. C. E. White, and C. L. Henderson, "Synthesis and characterization of photodefinable polycarbonates for use as sacrificial materials in the fabrication of microfluidic devices", Proc. SPIE, 4690, 242-253, 2002.
3. E. H. Martin, and W. J. Brittain, "A convenient laboratory preparation of aromatic polycarbonate", Polymer Bulletin, 47, 517-520, 2002.
4. T. X. Neenan, F. M. Houlihan, E. Reichmanis, J. M. Kometani, B. J. Bachman, and L. F. Thompson, "Photo- and Thermochemistry of Select 2,5-Dinitrobenzyl Esters in Polymer Matrices: Studies Pertaining to Chemical Amplification and Imaging", Macromolecules, 23, 145-150, 1990.
5. J. E. Beecher, G. H. McGall, and M. J. Goldberg, "Chemically Amplified Photolithography for the Fabrication of High Density Oligonucleotide Arrays", Polym Mat. Sci. & Eng., 76, 597-598, 1997.
6. J. Sturtevant, L. Insalaco, T. Flaim, V. Krishnamurthy, J. Meador, J. Petersen, and A. Eckert, "Removable organic antireflective coating", Proc. SPIE, 2724, 738-746, 1996.
7. H. Yoshino, T. Itani, S. Hashimoto, M. Yamana, T. Yoshii, and H. Tanabe, "Compatibility of chemical amplified photoresists with bottom anti-reflective coatings", Proc. SPIE, 3333, 655-665, 1998.
8. M. Shirai, K. Suyama, and M. Tsunooka, "Photoacid and photobase generation in photoresists", Photochemistry & Photobiology, 5, 169-185, 1999, and references therein.